---
title: Joint Research Partnership - EFC and University of Nebraska Lincoln
description: EFC and University of Nebraska-Lincoln evaluate low-GWP fluorocarbons as a replacement for incumbent fluorocarbons (FCs) and hydrofluorocarbons (HFCs) in the semiconductor etching industry.
image: https://blog.efcgases.com/hubfs/_dsc0929-2.jpg
---

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# Joint Research Partnership - EFC and University of Nebraska Lincoln

![Dr. Robert Syvret, Ph.D. FACS](https://blog.efcgases.com/hs-fs/hubfs/Electronic%20Fluorocarbons%20-%20September%202021-452-%20-%20Small%20sRGB.jpg?width=45&name=Electronic%20Fluorocarbons%20-%20September%202021-452-%20-%20Small%20sRGB.jpg) 

[Dr. Robert Syvret, Ph.D. FACS](https://blog.efcgases.com/author/dr-robert-syvret-ph-d-facs)

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# Electronic Fluorocarbons has initiated a joint research program with researchers at the University of Nebraska-Lincoln (UNL). The work will focus on evaluation of low global warming (low-GWP) fluorocarbons as sustainable replacements for incumbent fluorocarbons (FCs) and hydrofluorocarbons (HFCs), which are used for critical semiconductor etching applications in the semiconductor materials processing area. The continued use of the incumbent fluorocarbon and hydrofluorocarbon gases in semiconductor etching applications is a subject of great importance. There are currently no viable alternatives to the continued use of these gases, although these “greenhouse gases” have a negative impact on the environment.

The University of Nebraska-Lincoln is home to the Nebraska Center for Materials and Nanoscience (NCMN) and is one of 16 national research centers supported by the Federal National Science Foundation (NSF). The NCMN is a state-of-the-art research facility with world class nanotechnology capabilities and researchers. The collaborative research program, funded exclusively by EFC, will investigate the use of several of EFC’s proprietary low-GWP semiconductor etching candidates for high aspect ratio (HAR) etching of silicon-based materials. Through strategically designed matrices of experiments, the performance of several low-GWP candidates will be evaluated and assessed in head-to-head comparisons against incumbent fluorocarbons such as FC-c318, octafluorocyclobutane (C4F8) and hydrofluorocarbons such as HFC-23, trifluoromethane (CHF3). The goal of this research program is to develop viable semiconductor etching processes for critical semiconductor materials using sustainable products with a low environmental impact. This fluorocarbon environmental impact initiative is just one of several that EFC has recently launched to introduce and provide sustainable high-quality products to the electronics industry.

![Dr. Robert Syvret, Ph.D. FACS](https://blog.efcgases.com/hs-fs/hubfs/Electronic%20Fluorocarbons%20-%20September%202021-452-%20-%20Small%20sRGB.jpg?width=150&name=Electronic%20Fluorocarbons%20-%20September%202021-452-%20-%20Small%20sRGB.jpg)

#### Dr. Robert Syvret, Ph.D. FACS

As Chief Scientist with Electronic Fluorocarbons, Bob Syvret plays a primary role in developing new commercial products and improving process technology and safety protocols. His thirty plus year career has focused on industrial fluorine chemistry and technology where he has developed new commercial products (Selectfluor® and and DeoxoFluor™) and improved process technology for the production of low-GWP refrigerants as well as F2, NF3, SiF4, SF4, SF6, BrF3, ClF3, WF6, C4F6, CF4, C2F6, IF5, CF3OF, CF2(OF)2, and several C/H/F/O compounds as advanced etch candidates. Before joining EFC, Syvret was with Voltaix for two years as New Product Development Scientist, Arkema, Inc. for five years as Research Fellow in Fluorine Chemistry, and Air Products and Chemicals for twenty-two years as Research Associate – Fluorine Chemistry. Dr. Syvret holds numerous patents and was awarded the 2020 American Chemical Society National Award for Creative Work in Fluorine Chemistry for lifetime achievements, being only the 2nd industrial chemist to receive this honor since its inception in 1972. He is a Fellow of the American Chemical Society, a Research Fellow with Lehigh University Department of Chemistry, and a Visiting Scientist with the University of Albany Department of Chemistry. He serves as Treasurer of the ACS Division of Fluorine Chemistry. Dr. Syvret holds B.Sc. and Ph.D. degrees in main group fluorine chemistry from McMaster University, Hamilton, Ontario, Canada.

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